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Ultrasuper DI Water CMOS Cleaning Machine Wafer 7LPM Two Fluid cleaning machine

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Ultrasuper DI Water CMOS Cleaning Machine Wafer 7LPM Two Fluid cleaning machine

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Brand Name :	SHENHUA
Model Number :	CMC-800
Certification :	CE,UL
Price :	negotiation
Payment Terms :	L/C, T/T, D/P, Western Union, Paypal, Money Gram
Supply Ability :	300sets per year
Delivery Time :	30~40 days

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Ultrasuper DI Water CMOS Cleaning Machine Wafer 7LPM Two Fluid cleaning machine

Machine introduction

CMC-800 Ultrasuper DI Water CMOS Cleaning Machine Wafer 7LPM Two Fluid cleaning machine is mainly used to clean micro dusts on camera module products such as: Wafer, CMOS, Holder...etc. By using oure DI water scan spray cleaning technology, CMC-800 wash out very little micro dusts and by using 1000RPM centrifugal dry technology, CMC-800 can quickly make products dry.

Machine Features:
1. Specially designed to clean dusts on camera module products.
2. Mirror stainless steel structure, suitable for clean room.
3. Clean plate is specially made according to products, clean plate can be changed according to different products cleaning requirement.
4. PLC control, easy operation.
5. Transparent explosion-proof front door, safe operation, convenient for observation.
6. All machine displayed by meters. Cleaning status are monitoring at the time.
7. 2 stream clean, high cleaning precise, no damage to products, very few DI water consumption.
8. Rotate spray rods, no secondary pollution.
9. Equipped with static eliminator, cleaning room heat device, help to achieve best cleaning result.
10. Equipped with 2-level air filtration system, compressed air meet the standard of ISO8573.1.
11. Compact machine, smaller foot-print.
12. Use pure DI water, comply with RoHs standard.

Machine Spec:

Cleaning Plate	Custom-made (cleaning plate diameter<550mm)
Clean method	2 stream clean
Dry method	High speed centrifugal dry
Power supply	AC380V 50HZ
Power	7KW
Power consumption	Cleaning power : 3.5kw/h	Standby power: 1kw/h
Rotate power	3HP
Environment filtration method	0.3μm;99.999%
Air filtration method	1μm×1;0.01μm×1
Centrifugal rotating speed	100-1500RPM
Clean pressure	Water pressure:3-8Kgf/cm² air pressure:0.2-0.5Mpa
DI water supply	Flow rate:>7LPM Resistivity:>17MΩ
Air consumption	Pressure:0.45-0.7Mpa;flow rate:>30m³/H(good cleanness)
DI water let in diameter	ø12mm soft hose or PT1/2″ female joint
Air supply diameter	ø12mm hose
Water exit diameter	PT 1″female joint
Air exit diameter	4″×2(need air-pumping device, air speed over 3m/sec)
Machine size	880mm(L)×960mm(W)×1880mm(H)
Machine weight	450KG

Machine picutre:

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